Efficient Proximity Effect Correction Using Fast Multipole Method With Unequally Spaced Grid for Electron Beam Lithography. - Wenze Yao; Haojie Zhao; Chengyang Hou; Wei Liu; Hongcheng Xu; Xin Zhang 055; Jing Xiao; Jie Liu (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2023)

Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography. - Wenze Yao; Hongcheng Xu; Haojie Zhao; Ming Tao; Jie Liu (Microelectron. J., 2023)