Characterization of thin and ultra-thin SiO2 films and SiO2/Si interfaces with combined conducting and topographic atomic force microscopy. - Werner Frammelsberger; Guenther Benstetter; Thomas Schweinböck; Richard J. Stamp; Janice Kiely (Microelectron. Reliab., 2003)

AFM-based scanning capacitance techniques for deep sub-micron semiconductor failure analysis. - Günther Benstetter; Peter Breitschopf; Werner Frammelsberger; Heiko Ranzinger; Peter Reislhuber; Thomas Schweinböck (Microelectron. Reliab., 2004)

New trends in the application of Scanning Probe Techniques in Failure Analysis. - Thomas Schweinböck; S. Schömann; D. Álvarez; Marco Buzzo; Werner Frammelsberger; Peter Breitschopf; Günther Benstetter (Microelectron. Reliab., 2004)

Intermittent contact scanning capacitance microscopy-An improved method for 2D doping profiling. - Peter Breitschopf; Guenther Benstetter; Bernhard Knoll; Werner Frammelsberger (Microelectron. Reliab., 2005)

Kelvin probe force microscopy - An appropriate tool for the electrical characterisation of LED heterostructures. - Werner Bergbauer; Thomas Lutz; Werner Frammelsberger; Guenther Benstetter (Microelectron. Reliab., 2006)

Influence of the manufacturing process on the electrical properties of thin (k stacks observed with CAFM. - Mario Lanza; Marc Porti; Montserrat Nafría; Guenther Benstetter; Werner Frammelsberger; Heiko Ranzinger; E. Lodermeier; G. Jaschke (Microelectron. Reliab., 2007)

Protective nanometer films for reliable Cu-Cu connections. - Tobias Berthold; Guenther Benstetter; Werner Frammelsberger; Manuel Bogner; Rosana Rodríguez; Montserrat Nafría (Microelectron. Reliab., 2017)