Cost-effective cleaning and high-quality thin gate oxides. - Marc M. Heyns; Twan Bearda; Ingrid Cornelissen; Stefan De Gendt; Robin Degraeve; Guido Groeseneken; Conny Kenens; D. Martin Knotter; Lee M. Loewenstein; Paul W. Mertens; Sofie Mertens; Marc Meuris; et al. (IBM J. Res. Dev., 1999)

Breakdown spots of ultra-thin (EOT<1.5nm) HfO2/SiO2 stacks observed with enhanced - CAFM. - X. Blasco; Montserrat Nafría; Xavier Aymerich; J. Pétry; Wilfried Vandervorst (Microelectron. Reliab., 2005)

On the data interpretation of the C-AFM measurements in the characterization of thin insulating layers. - J. Pétry; Wilfried Vandervorst; Luigi Pantisano; Robin Degraeve (Microelectron. Reliab., 2005)

Nanometer-scale leakage measurements in high vacuum on de-processed high-k capacitors. - W. Polspoel; Wilfried Vandervorst; Lidia Aguilera; Marc Porti; Montserrat Nafría; Xavier Aymerich (Microelectron. Reliab., 2008)

Conductive filaments multiplicity as a variability factor in CBRAM. - Umberto Celano; Ludovic Goux; Attilio Belmonte; Karl Opsomer; Christophe Detavernier; Malgorzata Jurczak; Wilfried Vandervorst (IRPS, 2015)