A Further Analysis of the Forbidden Pitch in Photolithography in Advanced Technology Nodes. - Yanli Li; Xianhe Liu; Qi Wang; Qiang Wu (ASICON, 2023)

Improved BEOL Design Rules With 45-Degree Local Interconnection. - Xianhe Liu; Qiang Wu; Yanli Li; Qi Wang (ASICON, 2023)

Machine Learning-Enhanced Model-Based Optical Proximity Correction by Using Convolutional Neural Network-Based Variable Threshold Method. - Jinhao Zhu; Zhiwei Ren; Ying Li; Xianhe Liu; Qiang Wu; Yanli Li; Qi Wang (IEEE Access, 2024)

Machine Learning-Enhanced Model-Based Optical Proximity Correction Framework With Convolutional Neural Network-Based Variable Threshold Method Near the Diffraction Limit. - Jinhao Zhu; Liwan Yue; Ying Li; Xianhe Liu; Qiang Wu; Qi Wang; Yanli Li (IEEE Access, 2025)