On the current conduction mechanisms of CeO2/La2O3 stacked gate dielectric. - Xuan Feng 004; Hei Wong; B. L. Yang; Shurong Dong; Hiroshi Iwai; Kuniyuki Kakushima (Microelectron. Reliab., 2014)

Effects of thermal annealing on the charge localization characteristics of HfO2/Au/HfO2 stack. - Xuan Feng 004; Shurong Dong; Hei Wong; Danqun Yu; Kin Leong Pey; Kalya Shubhakar; W. S. Lau (Microelectron. Reliab., 2016)

The variation of the leakage current characteristics of W/Ta2O5/W MIM capacitors with the thickness of the bottom W electrode. - Danqun Yu; W. S. Lau; Hei Wong; Xuan Feng 004; Shurong Dong; Kin Leong Pey (Microelectron. Reliab., 2016)

Statistical nature of hard breakdown recovery in high-κ dielectric stacks studied using ramped voltage stress. - Xuan Feng 004; Nagarajan Raghavan; Sen Mei; Shurong Dong; Kin Leong Pey; Hei Wong (Microelectron. Reliab., 2018)