Analysis of instability line width and white wall created by the photolithography process. - Yang-Kuao Kuo; Chuen-Guang Chao; Chi-Yuan Lin (Microelectron. J., 2004)

Analysis of the effects of reflectance and refraction generated by wafers made from fused silica, ALOxNy and TiSixNy under different light sources on pattern length and best focus. - Yang-Kuao Kuo; Chuen-Guang Chao (Microelectron. J., 2005)

Control ability of spin coating planarization of resist filmand optimal control of developers. - Yang-Kuao Kuo; Chuen-Guang Chao (Microelectron. J., 2006)