A note on polygonal and elliptical approximation of mechanical parts. - Yasuo Nakagawa; Azriel Rosenfeld (Pattern Recognit., 1979)

Some experiments on variable thresholding. - Yasuo Nakagawa; Azriel Rosenfeld (Pattern Recognit., 1979)

Precise Visual Inspection Algorithm for LSI Wafer Patterns Using Grayscale Image Comparison. - Yukio Matsuyama; Hisafumi Iwata; Hitoshi Kubota; Yasuo Nakagawa (MVA, 1988)

Automatic 2 1/2 D shape inspection system for via-hole fillings of green sheets by shadow image analysis. - Takanori Ninomiya; Mineo Nomoto; Yasuo Nakagawa (ICRA, 1989)

Shape from focus: an effective approach for rough surfaces. - Shree K. Nayar; Yasuo Nakagawa (ICRA, 1990)

Precise Position Detection of a Mesh-Backed Printing Screen Based on the Smallest Enclosing Circle Detection. - Takanori Ninomiya; Yasuo Nakagawa (MVA, 1990)

Automated visual inspection for lsi water multilayer patterns by cascade pattern matching algorithm. - Shunji Maeda; Hitoshi Kubota; Hiroshi Makihira; Takanori Ninomiya; Yasuo Nakagawa; Yuzo Taniguchi (Syst. Comput. Jpn., 1990)

Precise Visual Inspection of LSI Wafer Patterns by Local Perturbation Pattern Matching Algorithm. - Yukio Matsuyama; Hisafumi Iwata; Hitoshi Kubota; Yasuo Nakagawa (Syst. Comput. Jpn., 1990)

Automatic screen-printed circuit pattern inspection using connectivity preserving image reduction and connectivity comparison. - Takanori Ninomiya; Kazushi Yoshimura; Mineo Nomoto; Yasuo Nakagawa (ICPR (1), 1992)

Development of Solder Joint Inspection Method Using Air Stimulation Speckle Vibration Detection Method and Fluorescence Detection Method. - Takashi Hiroi; Kazushi Yoshimura; Takanori Ninomiya; Toshimitsu Hamada; Yasuo Nakagawa; Shigeki Mio; Kouichi Karasaki; Hideaki Sasaki (MVA, 1992)

Precise visual inspection for LSI wafer patterns using subpixel image alignment. - Takashi Hiroi; Shunji Maeda; Hitoshi Kubota; Kenji Watanabe; Yasuo Nakagawa (WACV, 1994)

Shape from Focus. - Shree K. Nayar; Yasuo Nakagawa (IEEE Trans. Pattern Anal. Mach. Intell., 1994)

Development of an Enterprise-Wide Yield Management System Using Critical Area Analysis for High-Product-Mix Semiconductor Manufacturing. - Yuichi Hamamura; Chizu Matsumoto; Yoshiyuki Tsunoda; Koji Kamoda; Yoshio Iwata; Kenji Kanamitsu; Daisuke Fujiki; Fujihiko Kojika; Hiromi Fujita; Yasuo Nakagawa; Shun'ichi Kaneko (IEICE Trans. Electron., 2009)