Effect of the pre-gate oxide cleaning temperature on the reliability of GOI and devices performances in deep submicron CMOS technology. - Yen-Ting Chiang; Yean-Kuen Fang; Y. J. Huang; Tse-Heng Chou; S. Y. Yeh; C. S. Lin (Microelectron. Reliab., 2008)

Improvement of TDDB reliability, characteristics of HfO2 high-k/metal gate MOSFET device with oxygen post deposition annealing. - Chia-Wei Hsu; Yean-Kuen Fang; Wen-Kuan Yeh; Chun-Yu Chen; Yen-Ting Chiang; Feng-Renn Juang; Chien-Ting Lin; Chieh-Ming Lai (Microelectron. Reliab., 2010)

Chip Design of PTP Time Synchronization for Industrial IoT. - Yee-Shao Chen; Yuan-Sun Chu; Da-Wei Lo; Yen-Ting Chiang; Ting-Chao Hou (IEEE Access, 2025)