Highly Reliable 28nm Embedded Flash Process Development for High-Density and High-Speed Automotive Grade-1 Application. - Jaehun Lee; Youngcheon Jeong; Kyongsik Yeom; Changmin Jeon; Jongsung Woo; Sangjin Lee; Ga-Young Lee; Dong-Hwee Hwang; Yong Seok Chung; Minji Seo; Dong-Hyun Kim; DalHwan Kim; et al. (IMW, 2021)

A 28-nm 323 TOPS/mm2/b and 2007 TOPS/W/b Ternary Latch Based Sparsity-Aware CIM Macro With Double-Sampling Ternary ADC. - Myoung Kim; Hoichang Jeong; Woo-Seok Kim; Yesong Jeong; Young-Eun Choi; Junyoung Park 002; Min Woo Ryu; Yong Kyu Lee 002; Kyuho Jason Lee; Kyung Rok Kim (A-SSCC, 2024)