Mitigating IR-Drop with Design Technology Co-Optimization for Sub-Nanometer Node Technology. - Dohyeon Lee; Heecheol Hwang; Hyunteck Oh; Yongchan James Ban (ISOCC, 2021)

Optimizing and Addressing Stitch Challenges in High-NA EUV Lithography for Large Die Designs. - Yongchan James Ban; Gangsic Kim; Hosoon Shin (ISOCC, 2024)