Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. - Yoshihiko Hirai; Masaru Sasago; Masayuki Endo; Kiichiro Tsuji; Yojiro Mano (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1987)

Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system). - Yoshihiko Hirai; Sadafumi Tomida; Kazushi Ikeda; Masaru Sasago; Masayuki Endo; Sigeru Hayama; Noboru Nomura (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1991)