A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics. - Ke-Wei Su; Yi-Ming Sheu; Chung-Kai Lin; Sheng-Jier Yang; Wen-Jya Liang; Xuemei Xi; Chung-Shi Chiang; Jaw-Kang Her; Yu-Tai Chia; Carlos H. Diaz; Chenming Hu (CICC, 2003)

Foundry technology for 130nm and beyond SoC. - Denny D. Tang; Carlos H. Diaz; Chih-Ping Chao; Humning Hsu; Chwan-Ying Lee; Chih-Sheng Chang; Yu-Tai Chia; Ming-Ta Yang; Jack Yuan-Chen Sun (CICC, 2003)