Reactive ion etching technology in thin-film-transistor processing. - Yue Kuo (IBM J. Res. Dev., 1992)

A 10.5-in.-diagonal SXGA active-matrix display. - Evan G. Colgan; Paul M. Alt; Robert L. Wisnieff; Peter M. Fryer; Eileen A. Galligan; William S. Graham; Paul F. Greier; Raymond R. Horton; Harold Ifill; Leslie C. Jenkins; Richard A. John; Richard I. Kaufman; et al. (IBM J. Res. Dev., 1998)

Preface. - Yue Kuo (IBM J. Res. Dev., 1999)

Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays. - Yue Kuo; Kenji Okajima; Masatomo Takeichi (IBM J. Res. Dev., 1999)

Electrical reliability aspects of HfO2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress. - S. Chatterjee; Yue Kuo; J. Lu; J.-Y. Tewg; P. Majhi (Microelectron. Reliab., 2006)

Bayesian Analysis of Hazard Rate, Change Point, and Cost-Optimal Burn-In Time for Electronic Devices. - Tao Yuan; Yue Kuo (IEEE Trans. Reliab., 2010)

Bayesian Analysis for Accelerated Life Tests Using a Dirichlet Process Weibull Mixture Model. - Tao Yuan; Xi Liu; Saleem Z. Ramadan; Yue Kuo (IEEE Trans. Reliab., 2014)

Statistical Models of Overdispersed Spatial Defects for Predicting the Yield of Integrated Circuits. - Tao Yuan; Suk Joo Bae; Yue Kuo (IEEE Trans. Reliab., 2020)

Two-level differential burn-in policy for spatially heterogeneous defect units in semiconductor manufacturing. - Yuan Chen 005; Tao Yuan; Suk Joo Bae; Yue Kuo (Comput. Ind. Eng., 2021)