Sophisticated CMP Technology with In-Line Optical-Thickness Verification for Shallow-Trench-Isolation Formation in GAAFETs with Multilayered Si/SiGe Superlattices. - Yuji Kasashima; Takashi Matsukawa; Atsushi Yagishita; Yoshihiro Hayashi (Int. J. Autom. Technol., 2026)