Lithography and design integration - New paradigm for the technology architecture development. - Jongwook Kye; Yuansheng Ma; Lei Yuan; Yunfei Deng; Harry J. Levinson (CICC, 2012)

Layout small-angle rotation and shift for EUV defect mitigation. - Hongbo Zhang 001; Yuelin Du; Martin D. F. Wong; Yunfei Deng; Pawitter Mangat (ICCAD, 2012)

Impact of lithography retargeting process on low level interconnect in 20nm technology. - Hongbo Zhang 001; Yunfei Deng; Jongwook Kye; Martin D. F. Wong (SLIP, 2012)