Effect of Plasma Oxygen Content on the Size and Content of Silicon Nanoclusters in Amorphous SiOx Films Obtained with Plasma-Enhanced Chemical Vapor Deposition. - Vladimir A. Terekhov; Evgeniy I. Terukov; Yurii K. Undalov; Konstantin A. Barkov; Nikolay A. Kurilo; Sergey A. Ivkov; Dmitry N. Nesterov; Pavel Seredin; Dmitry Goloshchapov; Dmitry Minakov; Elena V. Popova; Anatoly N. Lukin; et al. (Symmetry, 2023)