PdEr-Silicide Formation and Contact Resistivity Reduction to n-Si(100) Realized by Dopant Segregation Process. - Shun'ichiro Ohmi; Yuya Tsukamoto; Weiguang Zuo; Yasushi Masahiro (IEICE Trans. Electron., 2018)

Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process. - Shun'ichiro Ohmi; Yuya Tsukamoto; Rengie Mark D. Mailig (IEICE Trans. Electron., 2019)