Variation Analysis of Interconnect Capacitance and Process Corner in Advanced CMOS Process with Double Patterning Technology. - Zhimei Cai; Zhiyong Han; Ming Tian; Changfeng Wang; Xiaoming Hu; Ran Cheng; Yi Zhao (ASICON, 2019)

Performance Investigation of Uniaxially Tensile Stressed Ge n-FinFETs Formed on Biaxially Strained GeOI Substrates And Its Impact On Ge CMOS Inverters. - Ran Cheng; Ming Tian; Changfeng Wang; Zhimei Cai; Jie Zhang; Yan-Yan Zhang; Yi Zhao (ASICON, 2019)