Adaptive modeling and H∞ control for photolithography manufacturing process. - Wei Kang; Ziqiang John Mao (ACC, 2004)

Synthesis of an event based supervisor for deadlock avoidance in semiconductor manufacturing systems. - Wenle Zhang; Ziqiang John Mao (ACC, 2004)

An adaptive model for the control of critical dimension in photolithography process. - Wei Kang; Ziqiang John Mao (CDC, 2004)

Synthesis of an event based deadlock avoidance supervisor for semiconductor manufacturing systems with choices in process flows. - Wenle Zhang; Ziqiang John Mao (CDC, 2004)