Moitreyee Mukherjee-Roy

According to our database, Moitreyee Mukherjee-Roy authored at least 4 papers between 2003 and 2004.

Collaborative distances:

• Dijkstra number of six.
• Erdős number of five.

2004

Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning.

Sohan Singh Mehta, Navab Singh, Moitreyee Mukherjee-Roy, Rakesh Kumar

Microelectron. J., 2004

Resist pattern peeling assessment in DUV chemically amplified resist.

Sohan Singh Mehta, Sun Hai Qin, Moitreyee Mukherjee-Roy, Navab Singh, Rakesh Kumar

Microelectron. J., 2004

2003

Defocusing image to pattern contact holes using attenuated phase shift masks.

Navab Singh, Moitreyee Mukherjee-Roy, Sohan Singh Mehta

Microelectron. J., 2003

A new approach for eliminating unwanted patterns in attenuated phase shift masks.

Moitreyee Mukherjee-Roy, Navab Singh, Sohan Singh Mehta, G. S. Samudra

Microelectron. J., 2003