Jeong-Soo Park

Affiliations:

SK hynix Inc., Memory Research and Development Division, Icheon, South Korea

According to our database¹, Jeong-Soo Park authored at least 3 papers in 2012.

Collaborative distances:

Dijkstra number² of five.
Erdős number³ of five.

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Bibliography

2012

Channel width dependence of mechanical stress effects induced by shallow trench isolation on device performance of nanoscale nMOSFETs.

[BibT_eX]

[DOI]

Microelectron. Reliab., 2012

Effect of electron-electron scattering at an elevated temperature on device lifetime of nanoscale nMOSFETs.

[BibT_eX]

[DOI]

Microelectron. Reliab., 2012

Enhanced degradation of n-MOSFETs with high-k/metal gate stacks under channel hot-carrier/gate-induced drain leakage alternating stress.

[BibT_eX]

[DOI]

Microelectron. Reliab., 2012

Jeong-Soo Park

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Bibliography

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