According to our database1, T. McArdle authored at least 2 papers between 2016 and 2017.
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Characterization of atomic layer deposited low-k spacer for FDSOI high-k metal gate transistor.
Proceedings of the 2017 IEEE International Conference on IC Design and Technology, 2017
Extending HKMG scaling on CMOS with FDSOI: Advantages and integration challenges.
Proceedings of the International Conference on IC Design and Technology, 2016