W. Boullart

According to our database, W. Boullart authored at least 2 papers between 2005 and 2015.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2015

Highly reliable TaOx ReRAM with centralized filament for 28-nm embedded application.

Yukio Hayakawa, Atsushi Himeno, Ryutaro Yasuhara, W. Boullart, E. Vecchio, T. Vandeweyer, T. Witters, D. Crotti, M. Jurczak, S. Fujii, S. Ito, Y. Kawashima, Yuuichirou Ikeda, Akifumi Kawahara, Ken Kawai, Zhiqiang Wei, Shunsaku Muraoka, Kazuhiko Shimakawa, Takumi Mikawa, Shinichi Yoneda

Proceedings of the Symposium on VLSI Circuits, 2015

2005

Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development.

S. Beckx, M. Demand, S. Locorotondo, K. Henson, M. Claes, V. Paraschiv, D. Shamiryan, P. Jaenen, W. Boullart, S. Degendt

Microelectron. Reliab., 2005