Dongxu Fan

According to our database, Dongxu Fan authored at least 2 papers between 2021 and 2023.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2023

Scaled contact length with low contact resistance in monolayer 2D channel transistors.

Wen-Chia Wu, Terry Y. T. Hung, D. Mahaveer Sathaiya, Dongxu Fan, Goutham Arutchelvan, Chen-Feng Hsu, Sheng-Kai Su, Ang-Sheng Chou, Edward Chen, Weisheng Li, Zhihao Yu, Hao Qiu, Ying-Mei Yang, Kuang-I Lin, Yun-Yang Shen, Wen-Hao Chang, San Lin Liew, Vincent D.-H. Hou, Jin Cai, Chung-Cheng Wu, Jeff Wu, H.-S. Philip Wong, Xinran Wang, Chao-Hsin Chien, Chao-Ching Cheng, Iuliana P. Radu

Proceedings of the 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits), 2023

2021

A compact model for transition metal dichalcogenide field effect transistors with effects of interface traps.

Yifei Xu, Weisheng Li, Dongxu Fan, Yi Shi, Hao Qiu, Xinran Wang

Sci. China Inf. Sci., 2021