Elena Atanassova

Affiliations:
  • Bulgarian Academy of Sciences, Sofia, Bulgaria


According to our database1, Elena Atanassova authored at least 12 papers between 2002 and 2014.

Collaborative distances:
  • Dijkstra number2 of five.
  • Erdős number3 of five.

Timeline

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Bibliography

2014
Time-dependent-dielectric-breakdown characteristics of Hf-doped Ta<sub>2</sub>O<sub>5</sub>/SiO<sub>2</sub> stack.
Microelectron. Reliab., 2014

2012
Doped Ta<sub>2</sub>O<sub>5</sub> and mixed HfO<sub>2</sub>-Ta<sub>2</sub>O<sub>5</sub> films for dynamic memories applications at the nanoscale.
Microelectron. Reliab., 2012

2011
Lightly Al-doped Ta<sub>2</sub>O<sub>5</sub>: Electrical properties and mechanisms of conductivity.
Microelectron. Reliab., 2011

2010
Constant current stress-induced leakage current in mixed HfO<sub>2</sub>-Ta<sub>2</sub>O<sub>5</sub> stacks.
Microelectron. Reliab., 2010

2008
Degradation behavior of Ta<sub>2</sub>O<sub>5</sub> stacks and its dependence on the gate electrode.
Microelectron. Reliab., 2008

Effects of the metal gate on the stress-induced traps in Ta<sub>2</sub>O<sub>5</sub>/SiO<sub>2</sub> stacks.
Microelectron. Reliab., 2008

2007
Metal gates and gate-deposition-induced defects in Ta<sub>2</sub>O<sub>5</sub> stack capacitors.
Microelectron. Reliab., 2007

Challenges of Ta<sub>2</sub>O<sub>5</sub> as high-k dielectric for nanoscale DRAMs.
Microelectron. Reliab., 2007

2005
Effect of microwave radiation on the properties of Ta<sub>2</sub>O<sub>5</sub>-Si microstructures.
Microelectron. Reliab., 2005

2003
Electrical properties of thin RF sputtered Ta<sub>2</sub>O<sub>5</sub> films after constant current stress.
Microelectron. Reliab., 2003

2002
Thermal Ta<sub>2</sub>O<sub>5</sub>--alternative to SiO<sub>2</sub> for storage capacitor application.
Microelectron. Reliab., 2002

Breakdown fields and conduction mechanisms in thin Ta<sub>2</sub>O<sub>5</sub> layers on Si for high density DRAMs.
Microelectron. Reliab., 2002


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