Chaeheon Kim

According to our database, Chaeheon Kim authored at least 1 paper in 2023.

Collaborative distances:

• Dijkstra number of six.
• Erdős number of four.

2023

Ultra-high Tunneling Electroresistance Ratio (2 × 10⁴) & Endurance (10⁸) in Oxide Semiconductor-Hafnia Self-rectifying (1.5 × 10³) Ferroelectric Tunnel Junction.

Junghyeon Hwang, Chaeheon Kim, Hunbeom Shin, Hwayoung Kim, Sang-Hee Ko Park, Sanghun Jeon

Proceedings of the 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits), 2023