D. Pic

According to our database1, D. Pic authored at least 4 papers between 2007 and 2008.

Collaborative distances:
  • Dijkstra number2 of six.
  • Erdős number3 of five.

Timeline

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Links

On csauthors.net:

Bibliography

2008
Dynamic stress method for accurate NVM oxide robustness evaluation for automotive applications.
Microelectron. Reliab., 2008

Assessment of temperature and voltage accelerating factors for 2.3-3.2 nm SiO<sub>2</sub> thin oxides stressed to hard breakdown.
Microelectron. Reliab., 2008

2007
A comprehensive study of stress induced leakage current using a floating gate structure for direct applications in EEPROM memories.
Microelectron. Reliab., 2007

Oxide reliability below 3 nm for advanced CMOS: Issues, characterization, and solutions.
Microelectron. Reliab., 2007


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