Kun Yuan

Affiliations:
  • Facebook Inc., San Jose, CA, USA
  • University of Texas at Austin, Electrical and Computer Engineering Department, Austin, TX, USA (PhD 2010)


According to our database1, Kun Yuan authored at least 17 papers between 2007 and 2016.

Collaborative distances:
  • Dijkstra number2 of five.
  • Erdős number3 of four.

Timeline

Legend:

Book 
In proceedings 
Article 
PhD thesis 
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Links

Online presence:

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Bibliography

2016
EBL Overlapping Aware Stencil Planning for MCC System.
ACM Trans. Design Autom. Electr. Syst., 2016

2015
Layout Decomposition for Triple Patterning Lithography.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2015

2013
E-BLOW: e-beam lithography overlapping aware stencil planning for MCC system.
Proceedings of the 50th Annual Design Automation Conference 2013, 2013

2012
E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2012

Dealing with IC manufacturability in extreme scaling (Embedded tutorial paper).
Proceedings of the 2012 IEEE/ACM International Conference on Computer-Aided Design, 2012

2011
E-beam lithography stencil planning and optimization with overlapped characters.
Proceedings of the 2011 International Symposium on Physical Design, 2011

Layout decomposition for triple patterning lithography.
Proceedings of the 2011 IEEE/ACM International Conference on Computer-Aided Design, 2011

AENEID: a generic lithography-friendly detailed router based on post-RET data learning and hotspot detection.
Proceedings of the 48th Design Automation Conference, 2011

2010
Double Patterning Layout Decomposition for Simultaneous Conflict and Stitch Minimization.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2010

Manufacturability Aware Routing in Nanometer VLSI.
Found. Trends Electron. Des. Autom., 2010

WISDOM: Wire spreading enhanced decomposition of masks in Double Patterning Lithography.
Proceedings of the 2010 International Conference on Computer-Aided Design, 2010

A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography.
Proceedings of the 15th Asia South Pacific Design Automation Conference, 2010

2009
BoxRouter 2.0: A hybrid and robust global router with layer assignment for routability.
ACM Trans. Design Autom. Electr. Syst., 2009

ELIAD: Efficient Lithography Aware Detailed Routing Algorithm With Compact and Macro Post-OPC Printability Prediction.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2009

Double patterning lithography friendly detailed routing with redundant via consideration.
Proceedings of the 46th Design Automation Conference, 2009

2008
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction.
Proceedings of the 45th Design Automation Conference, 2008

2007
BoxRouter 2.0: architecture and implementation of a hybrid and robust global router.
Proceedings of the 2007 International Conference on Computer-Aided Design, 2007


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