Andrew R. Neureuther

According to our database, Andrew R. Neureuther authored at least 14 papers between 1966 and 2010.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2010

Parameter-specific ring oscillator for process monitoring at the 45 nm node.

Lynn T.-N. Wang, Nuo Xu, Seng Oon Toh, Andrew R. Neureuther, Tsu-Jae King Liu, Borivoje Nikolic

Proceedings of the IEEE Custom Integrated Circuits Conference, 2010

2008

Crosstalk Noise Variation Assessment and Analysis for the Worst Process Corner.

Jae-Seok Yang, Andrew R. Neureuther

Proceedings of the 9th International Symposium on Quality of Electronic Design (ISQED 2008), 2008

2004

A Pattern Matching System for Linking TCAD and EDA.

Frank Gennari, Andrew R. Neureuther

Proceedings of the 5th International Symposium on Quality of Electronic Design (ISQED 2004), 2004

1995

Massively parallel electromagnetic simulation for photolithographic applications.

Alfred Kwok Kit Wong, Roberto Guerrieri, Andrew R. Neureuther

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1995

1994

Algorithms for simulation of three-dimensional etching.

Kenny K. H. Toh, Andrew R. Neureuther, Edward W. Scheckler

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1994

Models and algorithms for three-dimensional topography simulation with SAMPLE-3D.

Edward W. Scheckler, Andrew R. Neureuther

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1994

1993

An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification.

Edward W. Scheckler, Nelson N. Tam, Anton K. Pfau, Andrew R. Neureuther

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1993

1992

A utility-based integrated system for process simulation.

Edward W. Scheckler, Alexander S. Wong, Robert K. Wang, Goodwin R. Chin, John R. Camagna, Andrew R. Neureuther, Robert W. Dutton

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1992

1991

The intertool profile interchange format: a technology CAD environment approach [semiconductor technology].

Alexander S. Wong, Andrew R. Neureuther

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1991

Massively parallel algorithms for scattering in optical lithography.

Roberto Guerrieri, Karim H. Tadros, John K. Gamelin, Andrew R. Neureuther

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1991

Linking TCAD to EDA - Benefits and Issues.

Goodwin R. Chin, Walter C. Dietrich Jr., Duane S. Boning, Alexander S. Wong, Andrew R. Neureuther, Robert W. Dutton

Proceedings of the 28th Design Automation Conference, 1991

1988

SIMPL-2: (SIMulated Profiles from the Layout-Version 2).

K. Lee, Andrew R. Neureuther

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1988

Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography.

Roberto Guerrieri, Andrew R. Neureuther

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1988

1966

Interaction of Modulated Electron Beams With Open Periodic Structures

Andrew R. Neureuther

PhD thesis, 1966