Kanak B. Agarwal

According to our database, Kanak B. Agarwal authored at least 10 papers between 2010 and 2013.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2013

Layout Decomposition and Legalization for Double-Patterning Technology.

Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta

IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2013

2012

Design-aware lithography.

Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif

Proceedings of the International Symposium on Physical Design, 2012

O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction.

Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars W. Liebmann, Puneet Gupta

Proceedings of the IEEE International Conference on IC Design & Technology, 2012

Design driven patterning optimizations for low K1 lithography.

Kanak B. Agarwal, Shayak Banerjee

Proceedings of the IEEE International Conference on IC Design & Technology, 2012

2011

Coupling timing objectives with optical proximity correction for improved timing yield.

Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky

Proceedings of the 12th International Symposium on Quality Electronic Design, 2011

A framework for double patterning-enabled design.

Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta

Proceedings of the 2011 IEEE/ACM International Conference on Computer-Aided Design, 2011

Electrically-driven retargeting for nanoscale layouts.

Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif

Proceedings of the 2011 IEEE Custom Integrated Circuits Conference, 2011

2010

SMATO: Simultaneous mask and target optimization for improving lithographic process window.

Shayak Banerjee, Kanak B. Agarwal, Michael Orshansky

Proceedings of the 2010 International Conference on Computer-Aided Design, 2010

A methodology for propagating design tolerances to shape tolerances for use in manufacturing.

Shayak Banerjee, Kanak B. Agarwal, Chin Ngai Sze, Sani R. Nassif, Michael Orshansky

Proceedings of the Design, Automation and Test in Europe, 2010

Ground rule slack aware tolerance-driven optical proximity correction for local metal interconnects.

Shayak Banerjee, Kanak B. Agarwal, Michael Orshansky

Proceedings of the IEEE Custom Integrated Circuits Conference, 2010