Uwe Kerst
Affiliations:- TU Berlin, Department of High-Frequency and Semiconductor System Technologies, Germany
According to our database1,
Uwe Kerst
authored at least 14 papers
between 2005 and 2015.
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Bibliography
2015
A BIST structure for the evaluation of the MOSFET gate dielectric interface state density in post-processed CMOS chips.
Proceedings of the ESSCIRC Conference 2015, 2015
2014
Efficient and flexible Focused Ion Beam micromachining of Solid Immersion Lenses in various bulk semiconductor materials - An adaptive calibration algorithm.
Microelectron. Reliab., 2014
2013
Proceedings of the 2013 Workshop on Fault Diagnosis and Tolerance in Cryptography, 2013
2012
Proceedings of the 2012 IEEE International Symposium on Hardware-Oriented Security and Trust, 2012
2010
Optimizing focused ion beam created solid immersion lenses in bulk silicon using design of experiments.
Microelectron. Reliab., 2010
Microelectron. Reliab., 2010
2009
Physical analysis, trimming and editing of nanoscale IC function with backside FIB processing.
Microelectron. Reliab., 2009
2008
Comparison of laser voltage probing and mapping results in oversized and minimum size devices of 120 nm and 65 nm technology.
Microelectron. Reliab., 2008
IEEE Des. Test Comput., 2008
2007
Non destructive 3D chip inspection with nano scale potential by use of backside FIB and backscattered electron microscopy.
Microelectron. Reliab., 2007
Proceedings of the 2007 IEEE International Test Conference, 2007
2006
Contact to contacts or silicide by use of backside FIB circuit edit allowing to approach every active circuit node.
Microelectron. Reliab., 2006
2005
Electrical Performance Evaluation of FIB Edited Circuits through Chip Backside Exposing Shallow Trench Isolations.
Microelectron. Reliab., 2005
Proceedings of the Proceedings 2005 IEEE International Test Conference, 2005