Rolf-Peter Vollertsen

According to our database, Rolf-Peter Vollertsen authored at least 9 papers between 2002 and 2016.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2016

Fast wafer level reliability monitoring as a tool to achieve automotive quality for a wafer process.

Andreas Martin, Rolf-Peter Vollertsen, A. Mitchell, M. Traving, D. Beckmeier, H. Nielen

Microelectron. Reliab., 2016

2015

A fWLR test structure and method for device reliability monitoring using product relevant circuits.

Rolf-Peter Vollertsen, Georg Georgakos, K. Kölpin, C. Olk

Proceedings of the IEEE International Reliability Physics Symposium, 2015

2005

The TDDB power-law model - Physics and experimental evidences.

Rolf-Peter Vollertsen, Enrique Miranda

Microelectron. Reliab., 2005

Is the power-law model applicable beyond the direct tunneling regime?

Rainer Duschl, Rolf-Peter Vollertsen

Microelectron. Reliab., 2005

2004

Voltage acceleration and t63.2 of 1.6-10 nm gate oxides.

Rolf-Peter Vollertsen, Ernest Y. Wu

Microelectron. Reliab., 2004

Fast wafer level reliability: methods and experiences.

Rolf-Peter Vollertsen

Microelectron. Reliab., 2004

An introduction to fast wafer level reliability monitoring for integrated circuit mass production.

Andreas Martin, Rolf-Peter Vollertsen

Microelectron. Reliab., 2004

2003

Thin dielectric reliability assessment for DRAM technology with deep trench storage node.

Rolf-Peter Vollertsen

Microelectron. Reliab., 2003

2002

A new empirical extrapolation method for time-dependent dielectric breakdown reliability projections of thin SiO₂ and nitride-oxide dielectrics.

Fen Chen, Rolf-Peter Vollertsen, Baozhen Li, Dave Harmon, Wing L. Lai

Microelectron. Reliab., 2002