Richard B. R. van Silfhout

According to our database, Richard B. R. van Silfhout authored at least 8 papers between 2004 and 2010.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of five.

2010

Prediction of the epoxy moulding compound aging effect on package reliability.

Sander Noijen, Roy Engelen, Joerg Martens, Alexandru Opran, Olaf van der Sluis, Richard B. R. van Silfhout

Microelectron. Reliab., 2010

2007

Molecular simulation on the material/interfacial strength of the low-dielectric materials.

Cadmus A. Yuan, Olaf van der Sluis, G. Q. (Kouchi) Zhang, Leo J. Ernst, Willem D. van Driel, Richard B. R. van Silfhout

Microelectron. Reliab., 2007

Efficient damage sensitivity analysis of advanced Cu/low-k bond pad structures by means of the area release energy criterion.

Olaf van der Sluis, R. A. B. Engelen, Richard B. R. van Silfhout, W. D. van Driel, Marcel A. J. van Gils

Microelectron. Reliab., 2007

Virtual qualification of moisture induced failures of advanced packages.

Marcel A. J. van Gils, W. D. van Driel, G. Q. Zhang, H. J. L. Bressers, Richard B. R. van Silfhout, X. J. Fan, J. H. J. Janssen

Microelectron. Reliab., 2007

2006

Delamination analysis of Cu/low-k technology subjected to chemical-mechanical polishing process conditions.

Cadmus A. Yuan, Willem D. van Driel, Richard B. R. van Silfhout, Olaf van der Sluis, Roy A. B. Engelen, Leo J. Ernst, Fred van Keulen, G. Q. Zhang

Microelectron. Reliab., 2006

2005

Prediction of Delamination Related IC & Packaging Reliability Problems.

W. D. van Driel, Marcel A. J. van Gils, Richard B. R. van Silfhout, G. Q. Zhang

Microelectron. Reliab., 2005

2004

Prediction of crack growth in IC passivation layers.

Y. T. He, Marcel A. J. van Gils, Willem D. van Driel, G. Q. Zhang, Richard B. R. van Silfhout, Leo J. Ernst

Microelectron. Reliab., 2004

Prediction of interfacial delamination in stacked IC structures using combined experimental and simulation methods.

Willem D. van Driel, C. J. Liu, G. Q. Zhang, J. H. J. Janssen, Richard B. R. van Silfhout, Marcel A. J. van Gils, Leo J. Ernst

Microelectron. Reliab., 2004