Wenwu Wang
Orcid: 0009-0000-5203-8666Affiliations:
- Chinese Academy of Sciences, Institute of Microelectronics, Beijing, China
According to our database1,
Wenwu Wang
authored at least 15 papers
between 2016 and 2025.
Collaborative distances:
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Bibliography
2025
Trap Behaviors and Degradation Modeling in Positive Bias Temperature Instability of Back Gated IGZO Transistors.
Proceedings of the IEEE International Reliability Physics Symposium, 2025
NBTI Improvement of HfO2/TiN Gated pMOSFET by Low-Temperature Remote Hydrogen Plasma Treatment.
Proceedings of the IEEE International Reliability Physics Symposium, 2025
Improved Memory Window and Retention of Silicon Channel Hf0.5Zr0.5O2 FeFET by Using SiO2/HfO2/SiO2 Gate Side Interlayer.
Proceedings of the IEEE International Reliability Physics Symposium, 2025
2024
Development of an Algorithm for the Simultaneous Retrieval of Cloud-Top Height and Cloud Optical Thickness Combining Radiative Transfer and Multisource Satellite Information From O₄ Hyperspectral Measurements.
IEEE Trans. Geosci. Remote. Sens., 2024
Role of Nitrogen in Suppressing Interfacial States Generation and Improving Endurance in Ferroelectric Field Effect Transistors.
Proceedings of the IEEE International Memory Workshop, 2024
2023
Ultralow-Power Compact Artificial Synapse Based on a Ferroelectric Fin Field-Effect Transistor for Spatiotemporal Information Processing.
Adv. Intell. Syst., November, 2023
Comprehensive Study of Endurance Fatigue in the Scaled Si FeFET by in-situ Vth Measurement and Endurance Enhancement Strategy.
Proceedings of the IEEE International Memory Workshop, 2023
2022
Vertical Channel-All-Around (CAA) IGZO FET under 50 nm CD with High Read Current of 32.8 μA/μm (Vth + 1 V), Well-performed Thermal Stability up to 120 ℃ for Low Latency, High-density 2T0C 3D DRAM Application.
Proceedings of the IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits 2022), 2022
Proceedings of the IEEE International Reliability Physics Symposium, 2022
2021
A Fast DCIV Technique for Characterizing the Generation and Repassivation of Interface Traps Under DC/ AC NBTI Stress/Recovery Condition in Si p-FinFETs.
Proceedings of the IEEE International Reliability Physics Symposium, 2021
Comparative Study on the Energy Distribution of Defects under HCD and NBTI in Short Channel p-FinFETs.
Proceedings of the IEEE International Reliability Physics Symposium, 2021
2020
Influence of an ALD TiN capping layer on the PBTI characteristics of n-FinFET with ALD HfO<sub>2</sub>/TiN-capping/TiAl gate stacks.
Sci. China Inf. Sci., 2020
Single-event-transient effects in silicon-on-insulator ferroelectric double-gate vertical tunneling field effect transistors.
Sci. China Inf. Sci., 2020
Comparative Study on the Energy Profile of NBTI-Related Defects in Si and Ferroelectric p-FinFETs.
Proceedings of the 2020 IEEE International Reliability Physics Symposium, 2020
2016
Accurate lifetime prediction for channel hot carrier stress on sub-1 nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer.
Microelectron. Reliab., 2016