Marc Schaekers

According to our database, Marc Schaekers authored at least 5 papers between 1999 and 2019.

Collaborative distances:

• Dijkstra number of five.
• Erdős number of four.

2019

Study of the Mechanical Stress Impact on Silicide Contact Resistance by 4-Point Bending.

Yefan Liu, Hao Yu, Gaspard Hiblot, Anastasiia Kruv, Marc Schaekers, Naoto Horiguchi, Dimitrios Velenis, Ingrid De Wolf

Proceedings of the IEEE International Reliability Physics Symposium, 2019

2016

Beyond-Si materials and devices for more Moore and more than Moore applications.

Nadine Collaert, AliReza Alian, Hiroaki Arimura, Geert Boccardi, Geert Eneman, Jacopo Franco, Tsvetan Ivanov, Dennis Lin, Jérôme Mitard, S. Ramesh, R. Rooyackers, Marc Schaekers, A. Sibaya-Hernandez, S. Sioncke, Quentin Smets, Abhitosh Vais, A. Vandooren, Anabela Veloso, Anne S. Verhulst, Devin Verreck, Niamh Waldron, Amey Walke, Liesbeth Witters, H. Yu, X. Zhou, Aaron Voon-Yew Thean

Proceedings of the International Conference on IC Design and Technology, 2016

2005

Optimization of low temperature silicon nitride processes for improvement of device performance.

E. Sleeckx, Marc Schaekers, X. Shi, E. Kunnen, B. Degroote, M. Jurczak, Muriel de Potter de ten Broeck, E. Augendre

Microelectron. Reliab., 2005

2001

Impact of gate oxide nitridation process on 1/f noise in 0.18 mum CMOS.

M. Da Rold, Eddy Simoen, Sofie Mertens, Marc Schaekers, G. Badenes, Stefaan Decoutere

Microelectron. Reliab., 2001

1999

Cost-effective cleaning and high-quality thin gate oxides.

Marc M. Heyns, Twan Bearda, Ingrid Cornelissen, Stefan De Gendt, Robin Degraeve, Guido Groeseneken, Conny Kenens, D. Martin Knotter, Lee M. Loewenstein, Paul W. Mertens, Sofie Mertens, Marc Meuris, Tanya Nigam, Marc Schaekers, Ivo Teerlinck, Wilfried Vandervorst, Rita Vos, Klaus Wolke

IBM J. Res. Dev., 1999