Barry J. O'Sullivan

Affiliations:
  • KU Leuven, Belgium


According to our database1, Barry J. O'Sullivan authored at least 17 papers between 2001 and 2022.

Collaborative distances:
  • Dijkstra number2 of five.
  • Erdős number3 of four.

Timeline

Legend:

Book 
In proceedings 
Article 
PhD thesis 
Dataset
Other 

Links

On csauthors.net:

Bibliography

2022
Trap-polarization interaction during low-field trap characterization on hafnia-based ferroelectric gatestacks.
Proceedings of the IEEE International Reliability Physics Symposium, 2022

Modelling ultra-fast threshold voltage instabilities in Hf-based ferroelectrics.
Proceedings of the IEEE International Reliability Physics Symposium, 2022

Wafer-Level Aging of InGaAs/GaAs Nano-Ridge p-i-n Diodes Monolithically Integrated on Silicon.
Proceedings of the IEEE International Reliability Physics Symposium, 2022

Bias Temperature Instability (BTI) of High-Voltage Devices for Memory Periphery.
Proceedings of the IEEE International Reliability Physics Symposium, 2022

2021
CV Stretch-Out Correction after Bias Temperature Stress: Work-Function Dependence of Donor-/Acceptor-Like Traps, Fixed Charges, and Fast States.
Proceedings of the IEEE International Reliability Physics Symposium, 2021

Edge-induced reliability & performance degradation in STT-MRAM: an etch engineering solution.
Proceedings of the IEEE International Reliability Physics Symposium, 2021

STT-MRAM array performance improvement through optimization of Ion Beam Etch and MTJ for Last-Level Cache application.
Proceedings of the IEEE International Memory Workshop, 2021

2020
The Mysterious Bipolar Bias Temperature Stress from the Perspective of Gate-Sided Hydrogen Release.
Proceedings of the 2020 IEEE International Reliability Physics Symposium, 2020

Understanding and empirical fitting the breakdown of MgO in end-of-line annealed MTJs.
Proceedings of the 2020 IEEE International Reliability Physics Symposium, 2020

2019
Gate-Stack Engineered NBTI Improvements in Highvoltage Logic-For-Memory High-ĸ/Metal Gate Devices.
Proceedings of the IEEE International Reliability Physics Symposium, 2019

Accelerated Device Degradation of High-Speed Ge Waveguide Photodetectors.
Proceedings of the IEEE International Reliability Physics Symposium, 2019

2018
Comphy - A compact-physics framework for unified modeling of BTI.
Microelectron. Reliab., 2018

Extended RVS characterisation of STT-MRAM devices: Enabling detection of AP/P switching and breakdown.
Proceedings of the IEEE International Reliability Physics Symposium, 2018

Characterization and physical modeling of the temporal evolution of near-interfacial states resulting from NBTI/PBTI stress in nMOS/pMOS transistors.
Proceedings of the IEEE International Reliability Physics Symposium, 2018

Study of breakdown in STT-MRAM using ramped voltage stress and all-in-one maximum likelihood fit.
Proceedings of the 48th European Solid-State Device Research Conference, 2018

2005
Electrical characterization of HfO<sub>2</sub> films obtained by UV assisted injection MOCVD.
Microelectron. Reliab., 2005

2001
Flat band voltage shift and oxide properties after rapid thermal annealing.
Microelectron. Reliab., 2001


  Loading...